Thin Film Fabrication Technology
- Al2O3、AlN, BeO, Sapphire, quartz and hi-K dielectrics
- Wide selection of material and metallization
- Accurately controlled dimensions and tolerances
- Hollow plated vias
- Plating and etching facilities
- Extensive dicing and laser machining facilities
一、Substrate Type and Specifications
|
Substrate Material |
Purity |
A Surface Roughness |
B Surface Roughness |
Dielectric Constant |
Thermal Conductivity |
Dissipation Factor (Loss Tangent) |
|
% |
µ" |
µ" |
@1MHz |
W/mK |
@1MHz |
|
|
Asfired Alumina (A12O3) |
99.6 |
3 |
3 |
9.9±1 |
26.9 |
0.0001 |
|
Polished Alumina (Al2O3) |
99.6 |
1 |
1 or 12 |
9.9±1 |
26.9 |
0.0001 |
|
Aluminum Nitride (AlN) |
98 |
3 |
3 |
8.6 |
170 |
0.001 |
|
Beryllium Oxide (BeO) |
99.5 |
3 |
10 |
6.5 |
270 |
0.0004 |
|
Sapphire (A/C plane—Al2O3) |
100 |
1 |
1 |
10.0 |
- |
0.00086 |
|
Quartz (SiO2) |
100 |
1 |
1 |
4.4 |
- |
0.000015 |
二、Metalizations
|
Metallization System |
Application |
component Attachment Method |
Typical thickness range |
Max. use temperature |
|
TiW(Ti)/Pt/Au |
Standard thin film metal system for conductors |
Au/Sn, Au/Si, Au/Ge, Au/Sn, Au/Si, Au/Ge Eutectic; Epoxy |
TaN:25–100Ω /sq TiW(Ti):500–800Å Au:0.5–5µm, typical = 3µm
|
425℃ |
|
TaN/TiW(Ti)/Au |
Standard thin film metal system for conductors with resistor layer |
380℃ |
||
|
TiW(Ti)/Ni/Au |
Conductor applications that require Pb/Sn soldering |
Au/Sn, Au/Si, Au/Ge, Pb/Sn, Au/Sn, Au/Si, Au/Ge Eutectic;Pb/Sn; Epoxy |
TaN:25–100Ω /sq TiW(Ti):500–800Å Ni:1000–10000Å Au:0.5–5µm, typical = 3µm
|
350℃ |
|
TaN/TiW(Ti)/Ni/Au |
Conductor with resistor layer applications that require Pb/Sn soldering |
350℃ |
||
|
TaN/TiW (Ti)/Au/ Cu/Ni/Au |
High current &low loss applications |
Au/Sn, Au/Si, Au/Ge, Pb/Sn Au/Sn,Au/Si, Au/Ge Eutectic;Pb/Sn |
TaN:25–100Ω /sq TiW(Ti):500–800Å Au:0.2–1µm Cu:0.5–12µm Ni:0.5–2µm Au:0.5-5µm |
350℃ |
三、Standard Dimensions and Tolerance
*Aspect ratio is defined as: Dv/Ts. Where
Dv = Diameter of the via (thru hole)
Ts = Thickness of the substrate
|
項目 |
Specifications |
Typical |
|
|
英制 |
公制 |
||
|
Features |
Overall circuit size tolerance: |
±1mil |
±25µm |
|
Diced features: |
±1mil |
±25µm |
|
|
Minimum distance from the diced edge: |
1mil |
25µm |
|
|
Laser machined features: |
±2mil |
±50µm |
|
|
Minimum distance from the laser machined edge: |
2mil |
50µm |
|
|
Conductor |
Minimum line width: |
0.8mil |
20µm |
|
Minimum gap: |
0.4mil |
10µm |
|
|
Dimensional tolerance on critical areas: |
±0.1mil |
±2.5µm |
|
|
Dimensional tolerance on noncritical areas: |
±0.2mil |
±5µm |
|
|
Metal thickness tolerance: |
±20% |
||
|
Resistor |
Minimum length and width of resistors |
2×2mil |
50×50µm |
|
Resistor tolerance: |
±10%/±5%/±1% |
||
|
Watts density: |
≥3.8mW/mil2 |
≥6W/mm2 |
|
|
Vias |
*Via hole diameter aspect ratio: |
≥0.6 |
|
|
Via hole diameter tolerance: |
±2mil |
±50µm |
|
|
Minimum annular ring around metalized cutout: |
4mil |
100µm |
|
|
Minimum via hole spacing: |
One diameter |
||
|
Filled material: |
電鍍通孔Hollow plated vias Au或Cu實心孔Au/Cu solid filled vias |
||
|
Slot |
Metallization pullback: |
±2mil |
±50µm |
|
Metalized edge wrap minimum recess: |
4mil |
100µm |
|
|
Minimum radius: |
2mil |
50µm |
|

四、Photomasks Requirements
- Auto CAD .DWG or .DXF files
- Gerber photo plotter data
- DPF files
- DCF files
五、Documentation requirements
- Product structures with different meanings such as conductive tapes, resistors, mounting holes, grounding holes, product outlines, etc. must be drawn using different levels.
- Each layer of graphics must be closed without overlapping intersections and color filling.
- Drawing ratio 1:1, unit of imperial or metric
- The following parameters are indicated in the drawings:
| Material & Thickness | Size of substrates |
| Quantity | Metal system on both sides |
| Sheet resistance | Tolerance of resistors |
| Die attach method | Tolerance of line widths |
ADD:
No. 30, Xiangjiang Second Road, Huangdao District, Qingdao, Shandong, China
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E-mail:
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